Irgashev, S. U., Termez State University, Uzbekistan
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Vol 4, No 1 (2020) - EURASIAN JOURNAL OF PHYSICS AND FUNCTIONAL MATERIALS 2020, 4(1), 6-12
Optimal technological modes of ion implantation and following annealing for forming thin nanosized films of silicides
Abstract PDF (Eng)
ISSN 2522-9869 (Print)
ISSN 2616-8537 (Online)
ISSN 2616-8537 (Online)